Max Schmid, M. Sc.
Albert-Ludwigs University of Freiburg
Laboratory of Process Technology | NeptunLab
Department of Microsystems Engineering (IMTEK)
- since 02/2018: PhD student at the NeptunLab
Books and Book chapters
M. Schmid, F. Kotz, P. Risch, D. Wußler, B. E. Rapp: „Wavelength-selective negative photoresist for photolithography suitable for generating microstructures with up to three distinct height levels per exposure”, talk, SPIE Photonics West, San Francisco, 2019.